Hamburg, Germany

Ralph Schimpf

This inventor holds 1 USPTO granted patent. Top assignee: Beiersdorf Ag. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralph Schimpf. Retrieved from https://idiyas.com/inventor/ralph-schimpf-j6zf9jp2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Ralph Schimpf: Innovator in Cosmetic Formulations

Introduction

Ralph Schimpf is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of cosmetic and dermatological formulations. His innovative work focuses on the use of active ingredient combinations that enhance the effectiveness of cosmetic products.

Latest Patents

Ralph Schimpf holds a patent for "Active ingredient combinations or adducts of cyclodextrins and quinones." This patent involves the use of active ingredient combinations of cyclodextrins and at least one quinone and/or at least one hydroquinone for use in cosmetic or dermatological formulations. He has 1 patent to his name, showcasing his expertise in this specialized area.

Career Highlights

Ralph Schimpf is associated with Beiersdorf AG, a leading company in the skincare and cosmetic industry. His work at Beiersdorf AG has allowed him to contribute to the development of innovative products that meet consumer needs.

Collaborations

Throughout his career, Ralph has collaborated with notable colleagues, including Jens Nielsen and Heiner Max. These collaborations have further enriched his work and contributed to advancements in cosmetic formulations.

Conclusion

Ralph Schimpf's contributions to the field of cosmetic formulations highlight his innovative spirit and dedication to improving skincare products. His patent and collaborations reflect his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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