Sunland, CA, United States of America

Ralph Lutwack

This inventor holds 2 USPTO granted patents. Top assignee: California Institute of Technology. Active years: 1982-1984.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 1982-1984

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2 patents (USPTO):Explore Patents

Title: Ralph Lutwack: Innovator in Silicon Deposition Technology

Introduction

Ralph Lutwack is a notable inventor based in Sunland, California. He has made significant contributions to the field of silicon deposition technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Lutwack's latest patents focus on a process and apparatus for fluidized bed silicon deposition from silane. This innovative method involves thermally decomposing silicon-containing gas for deposition on fluidized nucleating silicon seed particles. In this process, silicon seed particles are produced in a secondary fluidized reactor through thermal decomposition of a silicon-containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fluidized bed. Silicon-containing gas is introduced into the primary reactor, where it is thermally decomposed and deposited on the fluidized silicon seed particles. The silicon seed particles, having the desired amount of thermally decomposed silicon product, are removed from the primary fluidized reactor as ultra-pure silicon product. An apparatus for carrying out this process is also disclosed in his patents.

Career Highlights

Ralph Lutwack has had a distinguished career, primarily associated with the California Institute of Technology. His work has significantly advanced the understanding and application of silicon deposition technologies.

Collaborations

Lutwack has collaborated with notable colleagues, including Richard A. Hogle and Harry Levin, contributing to various projects and innovations in the field.

Conclusion

Ralph Lutwack's contributions to silicon deposition technology reflect his innovative spirit and dedication to advancing the field. His patents and collaborations continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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