Ralph K Manriquez

Title: Ralph K Manriquez: Innovator in Semiconductor Technology

Introduction

Ralph K Manriquez is a notable inventor based in Saratoga, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of vapor phase etching.

Latest Patents

Manriquez holds a patent for an innovative method titled "Organic preclean for improving vapor phase wafer etch uniformity." This patent describes a method for achieving greater uniformity and control in vapor phase etching of silicon, silicon oxide layers, and related materials associated with wafers used for semiconductor devices. The process involves cleaning the wafer surface to remove organics, followed by vapor phase etching. Additionally, the patent outlines an integrated apparatus for cleaning organic materials and subsequently performing vapor phase etching. The invention incorporates cooling steps to increase throughput, an on-demand vaporizer for supplying vapor at non-azeotropic concentrations, and a residue-free etch process.

Career Highlights

Ralph K Manriquez is associated with Genus, Inc., where he has been instrumental in advancing semiconductor manufacturing techniques. His work has contributed to improving the efficiency and effectiveness of wafer processing.

Collaborations

Manriquez has collaborated with notable colleagues, including Michael A McNeilly and John M deLarios, who have also contributed to advancements in semiconductor technologies.

Conclusion

Ralph K Manriquez is a distinguished inventor whose work in vapor phase etching has the potential to significantly enhance semiconductor manufacturing processes. His innovative approaches continue to influence the industry and pave the way for future advancements.