Ralph J Ciotti

Title: Innovations of Ralph J. Ciotti

Introduction

Ralph J. Ciotti is a notable inventor based in Horseheads, NY (US). He has made significant contributions to the field of chemical vapor deposition and mass spectrometry. With a total of 3 patents to his name, his work has advanced the technology used in various industrial applications.

Latest Patents

One of his latest patents is titled "Halogen addition for improved adhesion of CVD copper to barrier." This process describes a method for depositing a copper film on a substrate surface through chemical vapor deposition of a copper precursor. The process involves treating a diffusion barrier layer surface and/or a deposited film with an adhesion-promoting agent, followed by annealing the copper film to the substrate. The suitable adhesion-promoting agents include organic halides such as methylene chloride, diatomic chlorine, diatomic bromine, diatomic iodine, HCl, HBr, and HI. This invention provides copper-based films with a predominant (111) texture, enhancing adhesion between the diffusion barrier layer and the copper film.

Another significant patent is for an "Apparatus for control of gas flow into a mass spectrometer using a series of small orifices." This invention features a gas sampling and inlet device for a mass spectrometer, consisting of a hollow housing sleeve and a coaxial hollow inner sleeve. The design allows for effective gas flow control into the mass spectrometer, improving the accuracy and efficiency of gas analysis.

Career Highlights

Ralph J. Ciotti is currently employed at Air Products and Chemicals, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the performance of chemical processes and analytical instruments.

Collaborations

Throughout his career, Ralph has collaborated with notable colleagues, including Scott Edward Beck and Eugene Joseph Karwacki, Jr. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Ralph J. Ciotti's contributions to the fields of chemical vapor deposition and mass spectrometry demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of material science and engineering principles, making a lasting impact in his industry.