Friedberg, Germany

Ralph Hoeck

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Osram Gesellschaft MIT Beschraenkter Haftung. Active years: 2013.

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ralph Hoeck - Innovator in Hg Low Pressure Discharge Lamp Technology

Introduction

Ralph Hoeck is a notable inventor based in Friedberg, Germany. He has made significant contributions to the field of lighting technology, particularly in the development of operating devices for low-pressure discharge lamps.

Latest Patents

Ralph Hoeck holds a patent for an "Operating device and method for operating at least one Hg low pressure discharge lamp." This innovative device is designed to operate at least one Hg low-pressure discharge lamp, which includes a first and a second electrode coil. The device features a unit that provides a variable correlated with the Hg vapor pressure in the lamp. Additionally, it comprises a unit for capturing emission spectra across specified spectral ranges, which includes at least one light receiving unit arranged in the beam path of the lamp.

Career Highlights

Throughout his career, Ralph Hoeck has worked with prominent companies in the lighting industry, including Osram Gesellschaft mit beschränkter Haftung and Osram GmbH. His experience in these organizations has allowed him to refine his expertise in lamp technology and contribute to advancements in the field.

Collaborations

Ralph Hoeck has collaborated with notable professionals such as Roger Hunt and Martin Zachau. These partnerships have likely enriched his work and led to innovative solutions in lighting technology.

Conclusion

Ralph Hoeck's contributions to the development of operating devices for Hg low-pressure discharge lamps highlight his role as an influential inventor in the lighting industry. His patent and collaborations reflect his commitment to innovation and excellence in technology.

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