Guy, TX, United States of America

Ralph G Harper

This inventor holds 2 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 1990-1991.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1990-1991

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2 patents (USPTO):Explore Patents

Title: Ralph G Harper: Innovator in Semiconductor Technology

Introduction

Ralph G Harper is a notable inventor based in Guy, Texas. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to contact formation and metal interconnects.

Latest Patents

Harper's latest patents include a method for forming CVD tungsten contacts in a planarized semiconductor body. This method utilizes aluminum as an etch mask and etch stop to prevent etching of underlying layers during contact formation. Another patent focuses on metal interconnects, detailing a method for forming these interconnects such that an intermediately formed aluminum layer provides an etch stop and etch mask during the tungsten etch back. This innovative approach allows for the formation of tungsten contacts without requiring pre-metal planarization of the semiconductor body.

Career Highlights

Ralph G Harper is currently employed at Texas Instruments Corporation, where he continues to develop and refine technologies that advance semiconductor manufacturing processes. His work has had a lasting impact on the industry, particularly in improving the efficiency and effectiveness of contact formation techniques.

Collaborations

Harper has collaborated with notable colleagues, including Stephen A Keller and Piper A Spry, contributing to a dynamic and innovative work environment.

Conclusion

Ralph G Harper's contributions to semiconductor technology through his patents and work at Texas Instruments Corporation highlight his role as a key innovator in the field. His methods for contact formation and metal interconnects represent significant advancements that continue to influence the industry.

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