Company Filing History:
Years Active: 2006-2011
Title: Ralf Ziebold: Innovator in Photolithography
Introduction
Ralf Ziebold is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of photolithography, particularly in the development of advanced methods and technologies. With a total of three patents to his name, Ziebold's work has had a considerable impact on the semiconductor industry.
Latest Patents
Ziebold's latest patents include a "Mask with registration marks and method of fabricating integrated circuits." This innovation involves a photomask for a lithography apparatus that features a chip pattern designed to be transferred into a resist layer on a workpiece. It also includes at least one registration mark that is not transferred into the resist layer, thereby improving mask qualification without affecting wafer-level processes. Another significant patent is the "Method for improving a simulation model of photolithographic projection." This method enhances a photolithographic simulation model by calculating a frequency-dependent intensity loss, which allows for accurate intensity distribution calculations in the substrate plane. This approach achieves the precision of three-dimensional models while significantly reducing processing time.
Career Highlights
Throughout his career, Ziebold has worked with prominent companies in the semiconductor sector, including Infineon Technologies AG and Qimonda AG. His experience in these organizations has allowed him to refine his expertise in photolithography and contribute to various innovative projects.
Collaborations
Ziebold has collaborated with notable professionals in his field, including David Howard Ziger and Frank Goodwin. These partnerships have further enriched his work and expanded the scope of his inventions.
Conclusion
Ralf Ziebold is a distinguished inventor whose contributions to photolithography have advanced the semiconductor industry. His innovative patents and collaborations reflect his commitment to enhancing technology in this critical field.
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