The Hague, Netherlands

Ralf Van Den Berg

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Sakura Finetek U.s.a., Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Van Den Berg. Retrieved from https://idiyas.com/inventor/ralf-van-den-berg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Ralf Van Den Berg: Innovator in Slide Management Systems

Introduction

Ralf Van Den Berg is a notable inventor based in The Hague, Netherlands. He has made significant contributions to the field of imaging technology, particularly with his innovative slide management system. His work has implications for various applications in medical and research settings.

Latest Patents

Ralf holds a patent for a slide management system, which includes an apparatus featuring a first and a second imaging module, a storage module, an automated transport module, and a controller. This system is designed to transport at least one slide for imaging purposes. The method involves capturing images of specimens on slides and efficiently managing their transport between different modules.

Career Highlights

Ralf Van Den Berg is currently associated with Sakura Finetek U.S.A., Inc., where he continues to develop and refine his innovative technologies. His expertise in imaging systems has positioned him as a key player in the industry.

Collaborations

Ralf collaborates with Erico Von Bueren, working together to advance their projects and share insights in the field of imaging technology.

Conclusion

Ralf Van Den Berg's contributions to slide management systems exemplify the intersection of innovation and technology in the medical field. His work continues to influence the way imaging is conducted, enhancing efficiency and accuracy in specimen analysis.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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