Saarbrücken, Germany

Ralf Tschuncky


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Ralf Tschuncky: Innovator in Thermomechanical Stress Detection

Introduction

Ralf Tschuncky is a notable inventor based in Saarbrücken, Germany. He has made significant contributions to the field of thermomechanical stress detection, particularly in the context of pipelines. His innovative approach has the potential to enhance the safety and reliability of metal structures under varying stress conditions.

Latest Patents

Ralf Tschuncky holds a patent for a method designed to detect temporally varying thermomechanical stresses and/or stress gradients over the wall thickness of metal bodies. This invention focuses on measuring the temperature on the outer surface of a body to determine temperature progression and stress progression. By utilizing electromagnetic ultrasonic transducers at specific measuring points, the method allows for the monitoring of stress changes over time, which is crucial for the fatigue monitoring of pipelines, especially during rapid stress changes. He has 1 patent to his name.

Career Highlights

Ralf Tschuncky is associated with Areva GmbH, a company known for its expertise in energy and nuclear technology. His work at Areva has positioned him as a key player in the development of advanced monitoring techniques for metal structures.

Collaborations

Throughout his career, Ralf has collaborated with several professionals, including Iris Altpeter and Hans-Georg Herrmann. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.

Conclusion

Ralf Tschuncky is a distinguished inventor whose work in thermomechanical stress detection has the potential to significantly impact the safety of pipelines and metal structures. His innovative methods and collaborations reflect his commitment to advancing technology in this critical field.

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