Ralf Schönberger

Title: Ralf Schönberger: Innovator in Photolithography

Introduction

Ralf Schönberger is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of photolithography, particularly in the analysis and automation of photolithographic masks. With a total of 2 patents to his name, Schönberger's work is instrumental in advancing technology in this area.

Latest Patents

Schönberger's latest patents include a method and apparatus for analyzing a defective location of a photolithographic mask. This invention involves several steps, including obtaining measurement data for the defective location, determining reference data from computer-aided design (CAD) data, correcting the reference data, and analyzing the defective location by comparing the measurement data to the corrected reference data. Another significant patent is a method and device for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner. This method includes performing line scans to locate elements of the alignment mark and estimating the reference point based on these elements.

Career Highlights

Ralf Schönberger is currently employed at Carl Zeiss SMT GmbH, a company renowned for its precision optics and photolithography equipment. His role at the company allows him to apply his innovative ideas and contribute to cutting-edge technology in the industry.

Collaborations

Throughout his career, Schönberger has collaborated with talented individuals such as Michael Budach and Michael Jöst. These collaborations have likely enriched his work and contributed to the success of his inventions.

Conclusion

Ralf Schönberger is a prominent figure in the field of photolithography, with valuable patents that enhance the technology used in this area. His contributions continue to influence advancements in photolithographic processes and equipment.