Eindhoven, Netherlands

Ralf Schafer

This inventor holds 2 USPTO granted patents. Top assignee: U.S. Philips Corporation. Active years: 1989-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Schafer. Retrieved from https://idiyas.com/inventor/ralf-schafer-43kfsqmu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1989-1991

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2 patents (USPTO):Explore Patents

Title: Ralf Schafer: Innovator in High-Pressure Discharge Lamp Technology

Introduction

Ralf Schafer is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lighting technology, particularly in the development of high-pressure discharge lamps. With a total of 2 patents to his name, Schafer's work has had a considerable impact on the efficiency and performance of lighting systems.

Latest Patents

Schafer's latest patents include an innovative operating circuit for a high-pressure discharge lamp. This circuit arrangement is designed to operate a high-pressure discharge lamp in conjunction with a controlled current limiter. The control signal used is composed of both a lamp-voltage-dependent signal part and a lamp-current-dependent signal part. Notably, the absolute value of the lamp-current-dependent signal part is smaller than that of the lamp-voltage-dependent signal part. This design allows for rapid control, ensuring that the lamp voltage remains substantially constant.

Another significant patent by Schafer is for a high-pressure sodium vapor discharge lamp. This lamp features a ceramic discharge vessel with a constant inner diameter over its length. The arrangement of electrodes within the lamp is such that they are positioned opposite each other at a specific distance. The lamp is capable of emitting white light during operation while consuming a maximum power of 50 watts. Its design promotes high efficiency and excellent color rendering, making it a valuable innovation in the lighting industry.

Career Highlights

Ralf Schafer is associated with U.S. Philips Corporation, a leading company in the field of lighting and electronics. His work at Philips has allowed him to focus on advancing lighting technologies and improving energy efficiency in various applications.

Collaborations

Schafer has collaborated with notable colleagues, including Lodewijk H Meessen and Petrus H Antonis. These collaborations have contributed to the development of innovative solutions in the lighting sector.

Conclusion

Ralf Schafer's contributions to high-pressure discharge lamp technology exemplify his commitment to innovation and efficiency. His patents reflect a deep understanding of lighting systems and their operational dynamics. Through his work, Schafer continues to influence the future of lighting technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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