Vienna, Austria

Ralf Rausch

This inventor holds 1 USPTO granted patent. Top assignee: Teich Aktiengesellschaft. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Rausch. Retrieved from https://idiyas.com/inventor/ralf-rausch-t4bqkhpw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Ralf Rausch: Innovator in Vinyl Alcohol Copolymers

Introduction

Ralf Rausch is a notable inventor based in Vienna, Austria. He has made significant contributions to the field of materials science, particularly through his work on vinyl alcohol copolymers. His innovative approach has led to the development of water-soluble films that have various applications in different industries.

Latest Patents

Ralf Rausch holds a patent for "Vinyl alcohol copolymers and water-soluble films containing them." This patent highlights his expertise in creating materials that are not only functional but also environmentally friendly. The patent showcases his commitment to advancing technology in a sustainable manner.

Career Highlights

Ralf Rausch is currently employed at Teich Aktiengesellschaft, where he continues to push the boundaries of innovation. His work at the company has allowed him to collaborate with other talented professionals in the field. His dedication to research and development has positioned him as a key figure in his area of expertise.

Collaborations

Ralf has worked alongside notable colleagues such as Franz Reiterer and Felix Wehrmann. These collaborations have fostered a creative environment that encourages the exchange of ideas and the pursuit of groundbreaking solutions.

Conclusion

Ralf Rausch's contributions to the field of vinyl alcohol copolymers exemplify the impact of innovative thinking in materials science. His work not only advances technology but also promotes sustainability in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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