Gundelfingen, Germany

Ralf Ostendorf

This inventor holds 1 USPTO granted patent. Top assignee: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Ostendorf. Retrieved from https://idiyas.com/inventor/ralf-ostendorf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Ralf Ostendorf: Innovator in Microelectromechanical Systems

Introduction

Ralf Ostendorf is a notable inventor based in Gundelfingen, Germany. He has made significant contributions to the field of microelectromechanical systems (MEMS). His work focuses on developing innovative optical devices that enhance laser tuning capabilities.

Latest Patents

Ralf Ostendorf holds a patent for a microelectromechanical system designed for tuning lasers. This micromechanically produced optical device represents a significant advancement in the field, showcasing his expertise and innovative approach.

Career Highlights

Ostendorf is affiliated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., a leading research organization in Germany. His role at this esteemed institution allows him to collaborate with other experts in the field and contribute to cutting-edge research.

Collaborations

Throughout his career, Ralf has worked alongside notable colleagues such as Joachim Wagner and Harald Schenk. Their combined efforts have led to advancements in MEMS technology and have furthered the understanding of optical devices.

Conclusion

Ralf Ostendorf's contributions to microelectromechanical systems and his innovative patent for laser tuning devices highlight his importance in the field of technology. His work continues to influence advancements in optical engineering and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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