Eschenlohe, Germany

Ralf Müller

This inventor holds 1 USPTO granted patent. Top assignee: Linde Aktiengesellschaft. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Müller. Retrieved from https://idiyas.com/inventor/ralf-müller-e0qrgf2n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Ralf Müller - Innovator in Gas Processing Technology

Introduction

Ralf Müller is a notable inventor based in Eschenlohe, Germany. He has made significant contributions to the field of gas processing technology, particularly through his innovative patent related to the TSA process.

Latest Patents

Ralf Müller holds a patent for the TSA process, which involves adjusting the cycle time of at least one method step in a two-component raw gas system. This adjustment is crucial for accommodating fluctuations in load, specifically when the load falls below the design value. His innovative approach enhances the efficiency and reliability of gas processing systems.

Career Highlights

Ralf Müller is associated with Linde Aktiengesellschaft, a leading company in the industrial gases sector. His work at Linde has allowed him to apply his expertise in gas processing and contribute to advancements in the industry.

Collaborations

Ralf Müller collaborates with Werner Leitmayr, a fellow innovator in the field. Their partnership has fostered the development of new technologies and solutions in gas processing.

Conclusion

Ralf Müller is a distinguished inventor whose work in the TSA process exemplifies innovation in gas processing technology. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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