Darmstadt, Germany

Ralf Liebler


Average Co-Inventor Count = 2.0

ph-index = 5

Forward Citations = 115(Granted Patents)


Company Filing History:


Years Active: 1984-1995

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8 patents (USPTO):Explore Patents

Title: Ralf Liebler: Innovator in Polymer Technology

Introduction

Ralf Liebler is a prominent inventor based in Darmstadt, Germany. He has made significant contributions to the field of polymer technology, holding a total of 8 patents. His work focuses on developing innovative materials that enhance the performance and compatibility of polymers.

Latest Patents

Among his latest patents is a groundbreaking invention titled "Compatible Polymer Mixtures." This patent describes a compatible, single-phase polyblend that includes a polymer such as polycarbonate, polyvinyl chloride, or polyvinylidene fluoride. It also features a copolymer that consists of a monomeric ester formed between acrylic acid or methacrylic acid and a C1-C10 alcohol, along with other specific monomers. Another notable patent is for "Molding Compositions for Optically Readable Information-Storage Media." This invention involves copolymers that are free of aromatic groups and are adaptable for use as molding compositions in optically readable data storage media.

Career Highlights

Ralf Liebler has built a successful career at Rohm GmbH, where he continues to innovate in the field of polymer science. His expertise and dedication have led to advancements that benefit various industries, particularly in the development of materials for data storage and other applications.

Collaborations

Throughout his career, Ralf has collaborated with esteemed colleagues such as Siegmund Besecke and Heinz-Juergen Hohage. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of cutting-edge research.

Conclusion

Ralf Liebler's contributions to polymer technology exemplify the impact of innovative thinking in material science. His patents reflect a commitment to advancing the field and addressing the challenges of modern applications.

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