Ralf Langhans

Title: Ralf Langhans: Innovator in Optical Measurement Technologies

Introduction

Ralf Langhans is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of optical measurement technologies, holding a total of 3 patents. His innovative approaches have advanced the methods used for measuring surface profiles and detecting buried layers in various materials.

Latest Patents

One of Langhans' latest patents is a measurement method for height profiles of surfaces using a differential interference contrast image. This method allows for the optical measurement of height profiles by recording an image that represents height gradients through intensity variations. The technology is particularly useful for identifying defects in surfaces with defined profiles.

Another significant patent is a method for detecting buried layers in flat objects, such as wafers. This arrangement utilizes a radiation source to illuminate the object's surface at an angle, along with a polarization filter and a detector. The method is designed to enhance the detection of layers by ensuring that only specific polarized radiation is analyzed, improving the accuracy of the measurements.

Career Highlights

Throughout his career, Ralf Langhans has worked with several companies, including Hseb Dresden GmbH and Unity Semiconductor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects in the field of optical technologies.

Collaborations

Langhans has collaborated with notable colleagues such as Bernd Srocka and Christine Schmidt. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Ralf Langhans is a distinguished inventor whose work in optical measurement technologies has made a lasting impact. His patents reflect a commitment to innovation and excellence in the field.