The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Apr. 05, 2013
Hseb Dresden Gmbh, Dresden, DE;
Bernd Srocka, Berlin, DE;
Ralf Langhans, Dresden, DE;
HSEB DRESDEN GmbH, Dresden, DE;
Abstract
The invention relates to an arrangement for analyzing an at least partially reflective surface of a wafer or other objects, containing a holder for holding the object; an inspection arrangement arranged at a distance in the region in front of the surface to be analyzed; and a measurement arrangement for determining the distance and/or inclination of the surface for the inspection arrangement; characterized be a radiation source, the radiation of which is directed towards the surface to be analyzed at an angle; and a spatially resolving detector for receiving the radiation from the radiation source that is reflected from the surface to be analyzed, wherein the radiation source and the detector are arranged outside the region necessary for the inspection between the inspection arrangement and the surface to be analyzed.