Lohmar, Germany

Ralf Klug

This inventor holds 1 USPTO granted patent. Top assignee: Celanese International Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Klug. Retrieved from https://idiyas.com/inventor/ralf-klug-0zbysv6i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Ralf Klug: Innovator in Cigarette Filter Technology

Introduction

Ralf Klug is a notable inventor based in Lohmar, Germany. He has made significant contributions to the field of cigarette filter technology. His innovative approach has led to the development of a unique patent that enhances the functionality of cigarette filters.

Latest Patents

Ralf Klug holds a patent for "Cigarette filters including latex bonded nonwoven fabric." This invention features a cigarette filter that incorporates a consolidated nonwoven fabric with an aqueous-based polymer binder. The polymer binder consists of one or more polymer compositions and is stabilized by high molecular weight protective colloids. This binder is particularly effective when applied to webs made via latex bonded airlaid or multibonded airlaid methods.

Career Highlights

Ralf Klug is associated with Celanese International Corporation, where he continues to innovate in the field of materials science. His work focuses on improving the quality and efficiency of cigarette filters, contributing to advancements in the industry.

Collaborations

Ralf collaborates with Paul Alexander Scott, leveraging their combined expertise to push the boundaries of cigarette filter technology.

Conclusion

Ralf Klug's contributions to cigarette filter technology exemplify the impact of innovative thinking in product development. His patent reflects a commitment to enhancing consumer products through scientific advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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