Company Filing History:
Years Active: 2003
Title: Ralf Dorfner: Innovator in Ion Source Technology
Introduction
Ralf Dorfner is a notable inventor based in Munich, Germany. He has made significant contributions to the field of ion source technology, particularly with his innovative patent related to gas inlet structures.
Latest Patents
Ralf Dorfner holds a patent for a gas inlet for an ion source. This invention features a gas inlet structure that includes a capillary for the admission of a sample gas. The capillary is positioned within a guide tube designed to discharge the sample gas into the ion source. The guide tube has an open end that is situated within the ion source itself. Additionally, the guide tube incorporates a valve that allows for the pulsed admission of a carrier gas. The entire assembly, including the guide tube, valve, and capillary, is supported in a sealed housing, ensuring that the sample gas is supplied in a pulsed manner.
Career Highlights
Ralf Dorfner is associated with the GSF-Forschungszentrum für Umwelt und Gesundheit GmbH, where he continues to work on advancements in environmental and health-related technologies. His expertise in ion source technology has positioned him as a valuable asset in his field.
Collaborations
Throughout his career, Ralf has collaborated with esteemed colleagues such as Egmont Rohwer and Ralf Zimmermann. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in their respective areas.
Conclusion
Ralf Dorfner's contributions to ion source technology through his patent demonstrate his commitment to innovation and advancement in the field. His work continues to influence the development of new technologies that enhance our understanding of environmental and health sciences.
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