Dornstadt, Germany

Ralf-Dirc Roitzheim

This inventor holds 1 USPTO granted patent. Top assignee: Basf Aktiengesellschaft. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf-Dirc Roitzheim. Retrieved from https://idiyas.com/inventor/ralf-dirc-roitzheim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Ralf-Dirc Roitzheim: Innovator in Emission Reduction Technologies

Introduction

Ralf-Dirc Roitzheim is a notable inventor based in Dornstadt, Germany. He has made significant contributions to the field of emission reduction technologies, particularly focusing on processes that minimize harmful exhaust fumes.

Latest Patents

Ralf-Dirc Roitzheim holds a patent for a "Process for reducing NO.sub.x from exhaust fumes." This innovation is crucial in addressing environmental concerns related to vehicle emissions and air quality.

Career Highlights

Roitzheim is associated with BASF Aktiengesellschaft, a leading chemical company known for its commitment to sustainability and innovation. His work at BASF has allowed him to develop and implement advanced technologies aimed at reducing pollutants.

Collaborations

Throughout his career, Ralf-Dirc Roitzheim has collaborated with esteemed colleagues such as Thomas Fetzer and Bernd Morsbach. These partnerships have fostered a collaborative environment that enhances innovation and research in emission reduction.

Conclusion

Ralf-Dirc Roitzheim's contributions to emission reduction technologies exemplify his commitment to environmental sustainability. His innovative patent and collaborative efforts with colleagues highlight the importance of teamwork in advancing technological solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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