Rajive Dhar

Title: Rajive Dhar: Innovator in Integrated Circuit Technology

Introduction

Rajive Dhar is a prominent inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly in the development of integrated circuit scribe line structures. With a total of 3 patents to his name, Dhar's work has had a notable impact on the industry.

Latest Patents

One of Rajive Dhar's latest patents is focused on integrated circuit scribe line structures and methods for making them. This innovative method involves forming a scribe line on a semiconductor wafer through a series of steps. First, a semiconductor substrate is provided, followed by the sequential application of multiple layers of alternating conductive and insulating types. Each layer features an elongated opening relative to a desired scribe line position. Notably, the openings in some layers are wider than those in preceding layers, resulting in a pronounced slope extending outwardly from the base of the completed scribe line. This design significantly reduces contamination issues and enhances planarization during subsequent spin-on-material processes. The scribe lines can be either elongated openings or an elongated mesa formed within the layers.

Career Highlights

Rajive Dhar is currently employed at VLSI Technology, Inc., where he continues to innovate in the semiconductor space. His expertise in integrated circuit technology has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Throughout his career, Dhar has collaborated with notable colleagues, including Edward R. Vokoun, III, and Miguel A. Delgado. These partnerships have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Rajive Dhar's contributions to integrated circuit technology exemplify the spirit of innovation in the semiconductor industry. His patents and ongoing work at VLSI Technology, Inc. continue to shape the future of this critical field.