Beavercreek, OH, United States of America

Rajeswaran Radhakrishnan

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Faraday Technology Corporation. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Rajeswaran Radhakrishnan: Innovator in Nanocarbon Coating Technology

Introduction

Rajeswaran Radhakrishnan is a notable inventor based in Beavercreek, OH (US). He has made significant contributions to the field of nanotechnology, particularly in the development of innovative coating systems. His work focuses on enhancing the performance of substrates through advanced materials.

Latest Patents

Radhakrishnan holds a patent for a "Nanocarbon coating system and coating method for stray and reflected light suppression." This patent describes a method of coating a substrate by adding a nanocarbon material to an electrophoretic solution. The process involves using an electrophoretic deposition apparatus that includes the substrate and an electrode spaced from the substrate. A current is applied to deposit the nanocarbon material onto the substrate, effectively suppressing stray and reflected light.

Career Highlights

Radhakrishnan is currently employed at Faraday Technology Corporation, where he continues to innovate in the field of nanotechnology. His expertise in nanocarbon materials has positioned him as a key player in developing advanced coating solutions.

Collaborations

Some of Radhakrishnan's coworkers include Maria E Inman and Timothy D Hall. Their collaborative efforts contribute to the ongoing research and development at Faraday Technology Corporation.

Conclusion

Rajeswaran Radhakrishnan's work in nanocarbon coating technology exemplifies the impact of innovative thinking in material science. His contributions are paving the way for advancements in various applications, showcasing the importance of research and development in this field.

Profile summary based on public USPTO records.
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