Rajesh Appat

Title: The Innovative Contributions of Rajesh Appat

Introduction

Rajesh Appat is a notable inventor based in Eagan, MN (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to transistors. His work exemplifies the intersection of creativity and engineering in the modern technological landscape.

Latest Patents

Rajesh Appat holds a patent for a "Transistor with single termination trench having depth more than 10 microns." This invention outlines a method of fabricating a transistor that includes depositing a first epitaxial layer, followed by a second epitaxial layer. A key feature of this patent is the formation of a single termination trench in the second epitaxial layer, which is filled with a dielectric. The depth of this termination trench exceeds 10 microns, enhancing the performance and efficiency of the transistor.

Career Highlights

Rajesh Appat is currently employed at Polar Semiconductor, Inc., where he continues to push the boundaries of semiconductor technology. His work at Polar Semiconductor has allowed him to collaborate with other talented professionals in the field, contributing to advancements in transistor design and fabrication.

Collaborations

Some of Rajesh's coworkers include Noel P Hoilien and Peter West. Their collective expertise fosters an environment of innovation and collaboration, driving forward the development of cutting-edge semiconductor solutions.

Conclusion

Rajesh Appat's contributions to the field of semiconductor technology, particularly through his patent on transistors, highlight his role as an influential inventor. His work not only advances technology but also inspires future innovations in the industry.