This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Jwi Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Rajat K Chakravarty: Innovator in Industrial Fabric Technology
Introduction
Rajat K Chakravarty is a notable inventor based in Kanata, Canada. He has made significant contributions to the field of industrial fabric technology. His innovative approach has led to the development of a unique multi-ply industrial fabric that incorporates integral jointing structures.
Latest Patents
Rajat holds a patent for a "Multi-ply industrial fabric having integral jointing structures." This invention describes a substantially planar jointed multi-layer industrial fabric, which is assembled from at least one segment comprising woven or nonwoven plies. The joints in this fabric utilize jointing yarns or formed structures placed at selected locations, such as the lateral edges of the fabric segments. These jointing elements interlock in a manner that provides an integral joint, allowing for various configurations, including hook-and-loop or slot-and-rib type joints. The assembly process of this fabric is designed to be efficient, requiring no further secondary processing of the joints.
Career Highlights
Throughout his career, Rajat has worked with several companies, including JWI Ltd. and AstenJohnson, Inc. His experience in these organizations has contributed to his expertise in fabric technology and innovation.
Collaborations
Rajat has collaborated with notable professionals in his field, including Samuel M Baker and Eugene Z Fekete. These collaborations have likely enriched his work and expanded the impact of his inventions.
Conclusion
Rajat K Chakravarty is a distinguished inventor whose work in multi-ply industrial fabrics showcases his innovative spirit and technical expertise. His contributions continue to influence the industry and pave the way for future advancements in fabric technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile