This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignees: Praxair S.t. Technology, Inc., Praxair Technology, Inc.. Active years: 2003-2009.
Company Filing History:
Years Active: 2003-2009
Title: Rajan Mathew: Innovator in Sputtering Technology
Introduction
Rajan Mathew is a notable inventor based in Nanuet, NY (US). He has made significant contributions to the field of sputtering technology, holding 2 patents that showcase his innovative approach to real-time monitoring and control in physical vapor deposition processes.
Latest Patents
Rajan Mathew's latest patents include a "System and apparatus for real-time monitoring and control of sputter target erosion." This invention relates to a method and apparatus designed to monitor and control the surface area erosion of a sputter target assembly utilized in a physical vapor deposition process. Another significant patent is the "Ring-type sputtering target," which features a design for uniformly depositing material on a substrate. This target consists of a circular disk with a radius and a top surface that includes a center region, an outer ring-shaped region, and a base region. The outer ring-shaped region is designed to extend the life of the sputtering target, while the center region increases the sputtering deposition rate on the substrate.
Career Highlights
Throughout his career, Rajan Mathew has worked with prominent companies such as Praxair Technology, Inc. and Praxair S.t. Technology, Inc. His experience in these organizations has contributed to his expertise in the field of sputtering technology.
Collaborations
Rajan has collaborated with notable coworkers, including Cetin Cetinkaya and Daniel R Marx. Their combined efforts have further advanced the innovations in sputtering technology.
Conclusion
Rajan Mathew's contributions to sputtering technology through his patents and career experiences highlight his role as an influential inventor in the field. His work continues to impact the industry positively.