Rainer Zimmermann

Title: Rainer Zimmermann: Innovator in Phase-Shifting Mask Technology

Introduction

Rainer Zimmermann is a notable inventor based in Munich, Germany. He has made significant contributions to the field of integrated circuit technology. His innovative work focuses on methods for generating corrected patterns for phase-shifting masks, which are crucial in the production of very-large-scale integrated circuits.

Latest Patents

Zimmermann holds a patent for the "OPC method for generating corrected patterns for a phase-shifting mask and its trimming mask and associated device and integrated circuit configuration." This method involves a two-step correction process. In the first step, a pattern for a phase-shifting mask is corrected. In the second step, the pattern for the trimming mask is corrected using the previously corrected pattern. This approach simplifies the correction of mask data, enhancing the efficiency of integrated circuit production.

Career Highlights

Rainer Zimmermann is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has positioned him as a key player in advancing technologies that support the semiconductor industry. His innovative methods have the potential to improve the manufacturing processes of integrated circuits significantly.

Collaborations

Zimmermann has collaborated with esteemed colleagues such as Wilhelm Maurer and Juergen Knobloch. These collaborations have fostered an environment of innovation and have contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Rainer Zimmermann's contributions to phase-shifting mask technology exemplify the importance of innovation in the semiconductor industry. His patented methods enhance the efficiency of integrated circuit production, showcasing his role as a significant inventor in this field.