Neu-Isenburg, Germany

Rainer Neeff

This inventor holds 3 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignees: Merck Patent Gmbh, Corning Incorporated. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rainer Neeff. Retrieved from https://idiyas.com/inventor/rainer-neeff-qu4lbzso

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Darmstadt, DE (2023)
  • Neu-Isenburg, DE (2024)

Company Filing History:


Years Active: 2023-2024

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3 patents (USPTO):Explore Patents

Title: Inventor Rainer Neeff

Introduction: Rainer Neeff is a renowned inventor based in Neu-Isenburg, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Rainer Neeff holds several patents in the areas of renewable energy, sustainable transportation, and advanced materials, showcasing his innovative spirit and commitment to creating a more sustainable future.

Career Highlights: With a career spanning over two decades, Rainer Neeff has worked with leading research institutions and companies to develop cutting-edge technologies that have revolutionized industries worldwide. His expertise in engineering and design has led to the successful commercialization of numerous inventions.

Collaborations: Throughout his career, Rainer Neeff has collaborated with top engineers, scientists, and industry experts to bring his ideas to life. His collaborative approach has resulted in the development of groundbreaking products that have received international acclaim.

Conclusion: Rainer Neeff's passion for innovation and his dedication to creating impactful solutions have solidified his reputation as a visionary inventor in the global technology landscape. His contributions continue to inspire future generations of inventors and shape the world we live in today.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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