Aalto, Finland

Raine Viitala

This inventor holds 2 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Aalto University, Aalto University Foundation Sr. Active years: 2025-2026.

USPTO Granted Patents = 2 

% Patents Active = 50.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Raine Viitala: Innovator in Machine Tool Technology

Introduction

Raine Viitala is a notable inventor based in Aalto, Finland. She has made significant contributions to the field of machine tool technology. Her innovative approach has led to the development of a unique patent that enhances the functionality of lathe machines.

Latest Patents

Raine Viitala holds a patent for an "Arrangement for providing centre displacement in a machine tool." This invention allows for the fastening of an object onto a lathe, enabling the location of the centre of rotation to be adjusted relative to the centre of the lathe axis. The design permits stepless and biaxial displacement of the centre of rotation according to a predetermined calculation, all without the need to remove the object from the chuck. This advancement significantly improves the efficiency and precision of machining processes.

Career Highlights

Raine is affiliated with Aalto University, where she continues to engage in research and development in her field. Her work is characterized by a commitment to innovation and practical applications of engineering principles.

Collaborations

Raine collaborates with esteemed colleagues such as Valtteri Vainio and Petri Kuosmanen. Their combined expertise fosters a dynamic research environment that encourages the exploration of new ideas and technologies.

Conclusion

Raine Viitala's contributions to machine tool technology exemplify the spirit of innovation. Her patent not only showcases her ingenuity but also enhances the capabilities of modern machining. Her work at Aalto University and collaborations with fellow researchers further solidify her impact in the field.

Profile summary based on public USPTO records.
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