Company Filing History:
Years Active: 2017
Title: Raia Finc - Innovator in Photoresist Technology
Introduction
Raia Finc is an accomplished inventor based in Shoreview, MN (US). He has made significant contributions to the field of photoresist technology, particularly in the development of low surface energy compositions for electronic device printing.
Latest Patents
Raia Finc holds a patent for a "Low surface energy photoresist composition and process." This innovative fluoropolymer-photoresist composition contains a fluorinated polymer designed for the containment of liquid inks in the printing of electronic devices. The patent outlines methods for applying and treating the fluoropolymer-photoresist composition to achieve low surface energy both before and after processing and development.
Career Highlights
Raia Finc is currently employed at E.I. du Pont de Nemours and Company, where he continues to advance his research and development efforts in photoresist technology. His work has been instrumental in enhancing the efficiency and effectiveness of electronic device manufacturing.
Collaborations
Raia has collaborated with notable coworkers, including Hjalti Skulason and Ines Wyrsta, who contribute to the innovative environment at E.I. du Pont de Nemours and Company.
Conclusion
Raia Finc's contributions to photoresist technology exemplify the impact of innovation in the electronics industry. His work continues to pave the way for advancements in manufacturing processes and materials.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.