The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Nov. 24, 2015
Applicant:
E I Du Pont DE Nemours and Company, Wilmington, DE (US);
Inventors:
Hjalti Skulason, Buellton, CA (US);
Raia Finc, Shoreview, MN (US);
Ines Wyrsta, Santa Barbara, CA (US);
Smita Dayal, Los Angeles, CA (US);
Steven Donald Dascomb, Oxnard, CA (US);
Assignee:
E I DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/0046 (2013.01); G03F 7/0387 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); H01L 27/3246 (2013.01);
Abstract
A fluoropolymer-photoresist composition containing fluorinated polymer for containment of liquid inks in the printing of electronic devices. Methods of applying and treating the fluoropolymer-photoresist composition containing fluorinated polymer to provide low surface energy before and after processing and development of the photoresist.