Company Filing History:
Years Active: 2017
Title: Ines Wyrsta: Innovator in Photoresist Technology
Introduction: Ines Wyrsta is a prominent inventor based in Santa Barbara, CA (US). She has made significant contributions to the field of photoresist technology, particularly in the development of low surface energy compositions. Her innovative work has implications for the printing of electronic devices, showcasing her expertise and dedication to advancing technology.
Latest Patents: Ines Wyrsta holds 1 patent for her invention titled "Low surface energy photoresist composition and process." This patent describes a fluoropolymer-photoresist composition that contains a fluorinated polymer, which is essential for the containment of liquid inks used in the printing of electronic devices. The methods outlined in her patent detail the application and treatment of this composition to achieve low surface energy both before and after processing and development.
Career Highlights: Ines Wyrsta is currently employed at E.I. du Pont de Nemours and Company, where she continues to push the boundaries of innovation in her field. Her work at this esteemed company has allowed her to collaborate with other talented professionals and contribute to groundbreaking advancements in photoresist technology.
Collaborations: Ines has worked alongside notable colleagues such as Hjalti Skulason and Raia Finc. These collaborations have enriched her research and development efforts, fostering an environment of creativity and innovation.
Conclusion: Ines Wyrsta's contributions to photoresist technology exemplify her commitment to innovation and excellence. Her patent and ongoing work at E.I. du Pont de Nemours and Company highlight her role as a leading inventor in the field.