Noida, India

Rahil Choudhary

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rahil Choudhary. Retrieved from https://idiyas.com/inventor/rahil-choudhary

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Rahil Choudhary: Innovator in Audio Management Technology

Introduction

Rahil Choudhary is an accomplished inventor based in Noida, India. He has made significant contributions to the field of audio management through his innovative patent. His work focuses on enhancing audio experiences by utilizing advanced techniques in spectrogram analysis.

Latest Patents

Rahil holds a patent titled "Method and device for managing audio based on spectrogram." This patent outlines a method for managing audio by generating a spectrogram of the audio. The process involves identifying spectrograms corresponding to vocals and music, extracting music features, and transmitting signals to a receiver device. The receiver can determine if an audio drop is occurring and generate audio accordingly, ensuring a seamless listening experience.

Career Highlights

Rahil is currently employed at Samsung Electronics Ltd., where he continues to develop innovative solutions in audio technology. His expertise in managing audio through spectrograms showcases his commitment to advancing the field.

Collaborations

Rahil collaborates with talented coworkers, including Apoorv and Ashish Chopra, who contribute to his projects and enhance the innovation process.

Conclusion

Rahil Choudhary's work in audio management technology exemplifies the impact of innovation in enhancing user experiences. His patent reflects a deep understanding of audio processing and a commitment to technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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