Webster, NY, United States of America

Ragni Mehta

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 2000.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Ragni Mehta: Innovator in Image Processing Technology

Introduction

Ragni Mehta is a notable inventor based in Webster, NY (US). He has made significant contributions to the field of image processing, particularly through his work at Xerox Corporation. His innovative approach has led to the development of a unique patent that enhances the efficiency of xerographic processes.

Latest Patents

Ragni Mehta holds a patent titled "Flexible xerographic process controls patch scheduler." This invention introduces an image processing control system that utilizes a patch schedule processor. The processor schedules the writing of patches to the photoreceptor belt on demand, responding to adjustments generated by prior cycles of image process control. This advancement is crucial for improving the quality and efficiency of xerographic printing.

Career Highlights

Throughout his career at Xerox Corporation, Ragni Mehta has demonstrated a commitment to innovation and excellence. His work has not only contributed to the company's success but has also advanced the field of image processing technology. With 1 patent to his name, he stands out as a key figure in his area of expertise.

Collaborations

Ragni has collaborated with talented individuals such as Keith A. May and Dawn Marie Kelsch. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Ragni Mehta's contributions to image processing technology through his patent and work at Xerox Corporation highlight his role as an innovator in the field. His dedication to advancing xerographic processes showcases the impact of his work on the industry.

Profile summary based on public USPTO records.
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