Kendall Park, NJ, United States of America

Raghuram Gummaraju

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Novi, MI (US) (2008)
  • Kendall Park, NJ (US) (2013)

Company Filing History:


Years Active: 2008-2013

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2 patents (USPTO):Explore Patents

Title: Raghuram Gummaraju: Innovator in Polymeric Technologies

Introduction

Raghuram Gummaraju is a notable inventor based in Kendall Park, NJ (US). He has made significant contributions to the field of polymeric technologies, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

Gummaraju's latest patents include a "Polymeric trap with adsorbent," which describes a method of adhering a particulate material, such as a hydrocarbon adsorbent material and/or a catalytic material, to a plastic surface. This invention also covers products that comprise the adhered material. Another significant patent is for a "Composition and process for forming a flexible polyurethane foam sealing device." This invention provides a composition and process for creating a flexible polyurethane foam sealing device that has improved compression set properties at increased temperatures. Notably, this sealing device is formed without the use of chemical blowing agents, utilizing an isocyanate component and a resin component with specific properties.

Career Highlights

Raghuram Gummaraju is currently employed at BASF Corporation, a leading company in the chemical industry. His work at BASF has allowed him to focus on innovative solutions in polymer technology, contributing to the company's reputation for excellence in research and development.

Collaborations

Throughout his career, Gummaraju has collaborated with talented individuals such as Mark Thomas Buelow and Laif R Alden. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Raghuram Gummaraju is a distinguished inventor whose work in polymeric technologies has led to valuable patents and advancements in the field. His contributions continue to influence the industry and inspire future innovations.

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