Northville, MI, United States of America

Raghavendra Keerthi Manda

This inventor holds 2 USPTO granted patents and 5 published patent applications. Top assignee: Gm Global Technolgoy Operations, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raghavendra Keerthi Manda. Retrieved from https://idiyas.com/inventor/raghavendra-keerthi-manda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Raghavendra Keerthi Manda: Battery Electrode Manufacturing Innovations

Introduction

Raghavendra Keerthi Manda is an inventor based in Northville, Michigan, whose patent work focuses on electrode manufacturing processes and equipment. His portfolio includes 2 patents.

Latest Patents

Manda’s listed patents include “Electrode Calendering with Rollers Having Controllable Sleeves” and “Electrode Foil Wrinkle Remover Band.” These inventions address electrode processing, including roller control during calendering and wrinkle removal from electrode foil.

Career Highlights

Manda is associated with GM Global Technology Operations, Inc. His patent portfolio reflects work on manufacturing techniques and equipment for battery electrodes.

Collaborations

Manda’s listed coworkers include Wayne Cai and Donghao Liu. Their shared association points to a broader professional environment connected with technology development at GM Global Technology Operations, Inc.

Conclusion

Raghavendra Keerthi Manda’s patents highlight practical approaches to electrode calendering and foil handling, contributing to innovation in battery manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…