Vail, AZ, United States of America

Rafael Quintero

This inventor holds 1 USPTO granted patent. Top assignee: Raytheon Company. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rafael Quintero. Retrieved from https://idiyas.com/inventor/rafael-quintero-s80e9k88

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Rafael Quintero: Innovator in Projectile Technology

Introduction

Rafael Quintero is a notable inventor based in Vail, Arizona. He has made significant contributions to the field of projectile technology, particularly with his innovative designs that enhance the protection of sensitive equipment.

Latest Patents

Quintero holds a patent for a "Hermetic covering system and method for a projectile." This invention includes a projectile with a body and a component that houses moisture-sensitive equipment. The design features at least one bag that is coupled to the body, allowing the projectile to protrude through an opening while protecting the component during storage.

Career Highlights

Rafael Quintero is associated with Raytheon Company, a leader in defense and aerospace systems. His work at Raytheon has allowed him to develop cutting-edge technologies that contribute to national security and advanced military capabilities.

Collaborations

Throughout his career, Quintero has collaborated with esteemed colleagues, including James Stephen Mason and James S Wilson. These partnerships have fostered innovation and have led to the development of advanced technologies in their respective fields.

Conclusion

Rafael Quintero's contributions to projectile technology exemplify his commitment to innovation and excellence. His patent for a hermetic covering system showcases his ability to address critical challenges in protecting sensitive equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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