Company Filing History:
Years Active: 2022-2024
Title: Raewon Yi: Innovator in Photomask Technology
Introduction
Raewon Yi is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His innovative work focuses on methods that enhance the performance and accuracy of photomasks used in semiconductor manufacturing.
Latest Patents
One of his latest patents is a method of annealing reflective photomasks using laser technology. This method involves preparing a reflective photomask that includes a pattern area and a border area. The process includes irradiating a laser beam onto the border area, which may involve split-irradiating multiple laser beam spots shaped by a beam shaper. Each spot has a center portion with a uniform energy profile and an edge portion with an inclined energy profile.
Another notable patent is an apparatus and method for measuring the phase of extreme ultraviolet (EUV) masks. This invention includes an EUV light source, mirrors, a mask stage, and a detector that measures reflectivity and diffraction efficiency. The processor then determines the phase of the EUV mask based on these measurements, which is crucial for the fabrication of high-precision EUV masks.
Career Highlights
Raewon Yi is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of photomask technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.
Collaborations
He collaborates with notable colleagues, including Hakseung Han and Jongju Park, who contribute to his innovative projects and research endeavors.
Conclusion
Raewon Yi's contributions to photomask technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His advancements are paving the way for future developments in semiconductor manufacturing.