Rabindra N Chakraborty

Title: Rabindra N Chakraborty: Innovator in Material Etching and Diamond Ablation

Introduction

Rabindra N Chakraborty is a notable inventor based in East Lansing, MI (US). He holds 2 patents that showcase his expertise in advanced material processing techniques. His innovative approaches have contributed significantly to the fields of etching and diamond ablation.

Latest Patents

Chakraborty's latest patents include a "Method for Radiofrequency Wave Etching." This method allows for selective controlled etching of materials by sequentially switching between two or more modes of radiofrequency waves. The etching process is conducted rapidly at pressures ranging from 0.5 mtorr to 10 torr, preferably utilizing microwave plasma etching. Another significant patent is the "Method of Synthetic Diamond Ablation with an Oxygen Plasma." This method involves applying colloidal graphite to the surface of a synthetic diamond and subjecting it to an oxygen plasma, effectively removing approximately 50 microns from the surface and resulting in a virtually pit-free finish.

Career Highlights

Throughout his career, Chakraborty has worked with prominent organizations such as Saint-Gobain/Norton Industrial Ceramics Corporation and Michigan State University. His work in these institutions has allowed him to develop and refine his innovative techniques in material processing.

Collaborations

Chakraborty has collaborated with notable colleagues, including Donnie K Reinhard and Paul D Goldman. These partnerships have further enhanced his research and development efforts in the field.

Conclusion

Rabindra N Chakraborty is a distinguished inventor whose contributions to material etching and diamond ablation have made a significant impact in his field. His innovative methods continue to advance technology and improve material processing techniques.