Saint-gobain/norton Industrial Ceramics Corporation

Michigan State University

Rabindra N Chakraborty

Donnie K Reinhard

Paul D Goldman

Jes Asmussen

Michael J Ferrecchia

A method for selective controlled etching of a material particularly by sequentially switching between two (2) or more modes of radiofrequency waves and/or by distance from a source of the microwaves. The modes and/or distance are selected depending upon the surface of the material to be etched. The etching is rapidly conducted at 0.5 mtorr to 10 torr, preferably using microwave plasma etching.

Method for radiofrequency wave etching

A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.

Growing community of inventors

East Lansing, MI, United States of America

Rabindra N Chakraborty