Venlo, Netherlands

R Van Hameren

This inventor holds 1 USPTO granted patent. Top assignee: Oce Holding B.v.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: R Van Hameren. Retrieved from https://idiyas.com/inventor/r-van-hameren

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: R Van Hameren: Innovator in Radiation-Curable Inkjet Ink Composition

Introduction

R Van Hameren is a notable inventor based in Venlo, Netherlands. He has made significant contributions to the field of inkjet technology, particularly with his innovative work on radiation-curable ink compositions. His expertise and creativity have led to advancements that benefit various printing applications.

Latest Patents

R Van Hameren holds a patent for a radiation-curable inkjet ink composition. This invention includes a gellant and relates to an ink set that utilizes such an ink composition. Additionally, it encompasses a method for creating this ink composition and a printing method that employs it. This patent showcases his commitment to enhancing the capabilities of inkjet printing technology.

Career Highlights

R Van Hameren is associated with Oce Holding B.V., a company known for its innovative solutions in the printing industry. His work at Oce has allowed him to explore and develop cutting-edge technologies that push the boundaries of traditional printing methods.

Collaborations

He has collaborated with notable colleagues, including Richard F E Van Hout and Björn H A J M Ketelaars. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

R Van Hameren's contributions to the field of radiation-curable inkjet ink compositions highlight his innovative spirit and dedication to advancing printing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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