R Niall Tait

Title: R Niall Tait: Innovator in Capacitive Microphone Technology

Introduction

R Niall Tait is a notable inventor based in Edmonton, Canada. He has made significant contributions to the field of microelectronics, particularly in the development of capacitive microphones. His innovative approach has led to advancements in microphone fabrication techniques.

Latest Patents

R Niall Tait holds a patent for the "Fabrication of a surface micromachined capacitive microphone." This patent describes a process for fabricating capacitive microphones using etch-release of sacrificial silicon by an isotropic dry etchant. The method allows for the production of microphones primarily from chemical vapor deposition (CVD) processes, providing flexibility in material selection. Notably, the dry etch chemistry used in this process does not require freeze-drying after release, and it does not attack electrodes or metallized circuitry. This enables the placement of electrodes between the backplate and diaphragm dielectric layers. The inclusion of diffusion barrier layers between the sacrificial and electrode layers protects both materials from interdiffusion during device fabrication. This process is particularly suitable for microphones that utilize silicon nitride dielectric layers with aluminum electrodes.

Career Highlights

Throughout his career, R Niall Tait has worked with prominent organizations such as the Alberta Microelectronic Centre and Harris Canada, Inc. His experience in these institutions has contributed to his expertise in microelectronic technologies and innovations.

Collaborations

R Niall Tait has collaborated with notable colleagues, including Alan W Mitchell and Yuebin B Ning. These collaborations have likely enriched his work and contributed to advancements in the field of capacitive microphones.

Conclusion

R Niall Tait's contributions to the field of capacitive microphone technology demonstrate his innovative spirit and technical expertise. His patent and career achievements reflect a commitment to advancing microelectronic fabrication techniques.