Friendswood, TX, United States of America

R Dwane Ruiz

This inventor holds 1 USPTO granted patent. Top assignee: Hydrochem Industrial Services, Inc.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: R Dwane Ruiz. Retrieved from https://idiyas.com/inventor/r-dwane-ruiz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: R Dwane Ruiz: Innovator in Combustion Turbine Cleaning Technologies

Introduction

R Dwane Ruiz is a notable inventor based in Friendswood, TX (US). He has made significant contributions to the field of combustion turbine cleaning technologies. His innovative approach addresses the challenges associated with cleaning films and particulates from combustion turbines.

Latest Patents

Ruiz holds a patent for a method titled "Forced mist cleaning of combustion turbines." This invention focuses on the effective removal of contaminants from the compressor and combustion sections of combustion turbines. The method involves forcing a mist containing a cleaning solution through the turbine's components, ensuring thorough cleaning without damaging the internal parts.

Career Highlights

R Dwane Ruiz is associated with Hydrochem Industrial Services, Inc., where he applies his expertise in developing advanced cleaning solutions for industrial applications. His work has been instrumental in enhancing the efficiency and longevity of combustion turbines.

Collaborations

Ruiz collaborates with Charles D Foster, leveraging their combined knowledge to innovate and improve cleaning technologies in the industry.

Conclusion

R Dwane Ruiz's contributions to combustion turbine cleaning technologies exemplify the impact of innovative thinking in industrial applications. His patent and ongoing work continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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