Petaluma, CA, United States of America

Qun Lu

This inventor holds 1 USPTO granted patent. Top assignee: Autodesk, Inc.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Qun Lu. Retrieved from https://idiyas.com/inventor/qun-lu-fllj2soj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Qun Lu: Innovator in Computer-Aided Design

Introduction

Qun Lu is a notable inventor based in Petaluma, CA (US), recognized for his contributions to the field of computer-aided design (CAD). With a focus on enhancing the functionality of CAD systems, Lu has developed innovative techniques that improve user experience and design efficiency.

Latest Patents

Qun Lu holds a patent for "Overriding layer properties in computer aided design viewports." This invention provides techniques for overriding layer display properties in CAD viewports. The method involves generating a display representation of a CAD drawing by identifying layers and their associated display properties. The resulting display representation includes drawing elements based on viewport display properties, enhancing the visual clarity and usability of CAD drawings.

Career Highlights

Lu is currently employed at Autodesk, Inc., a leading company in design software. His work at Autodesk has allowed him to contribute significantly to advancements in CAD technology. His innovative approach has positioned him as a valuable asset in the field of design engineering.

Collaborations

Throughout his career, Qun Lu has collaborated with talented individuals such as Karen Elaine Mason and Jose Madeira De Freitas Garcia. These collaborations have fostered a creative environment that encourages the development of groundbreaking solutions in CAD.

Conclusion

Qun Lu's contributions to computer-aided design through his innovative patent demonstrate his commitment to enhancing design technology. His work continues to influence the industry and improve the tools available to designers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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