Company Filing History:
Years Active: 1999
Title: Quat T Yu: Innovator in Interconnect Systems
Introduction
Quat T Yu is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of interconnect systems. His innovative work has led to the development of a unique patent that addresses critical challenges in electronic connectivity.
Latest Patents
Quat T Yu holds a patent titled "Capping layer in interconnect system and method for bonding the capping." This invention provides an interconnect system that includes a substrate and a first dielectric layer deposited upon it. The system features at least two electrically conductive interconnect lines formed on the dielectric layer, with adjacent side surfaces defining a space that has a dielectric constant substantially equal to 1. A dielectric film is bonded to the top surface of the interconnect lines, effectively preventing obstruction of the space during further processing. This innovation is crucial for enhancing the performance and reliability of electronic devices.
Career Highlights
Quat T Yu is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing and innovation. His work at Intel has allowed him to contribute to cutting-edge technologies that shape the future of electronics.
Collaborations
Throughout his career, Quat T Yu has collaborated with esteemed colleagues, including Brian S Doyle and Leopoldo D Yau. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Quat T Yu's contributions to interconnect systems exemplify the spirit of innovation in the technology sector. His patent and work at Intel Corporation highlight the importance of advancements in electronic connectivity.