Apex, NC, United States of America

Quan Sheng

This inventor holds 1 USPTO granted patent. Top assignee: W.c. Heraeus Holding Gmbh. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Quan Sheng. Retrieved from https://idiyas.com/inventor/quan-sheng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations by Quan Sheng in Semiconductor Technology

Introduction

Quan Sheng is an accomplished inventor based in Apex, NC (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to solder paste.

Latest Patents

Quan Sheng holds a patent for a no-clean low-residue solder paste specifically designed for semiconductor device applications. This solder paste is characterized by its homogeneous consistency and lack of tendency to separate. The residue left after application is clear and crystal-like, making it compatible with further processing steps without the need for solvent cleaning to remove flux residue. The formulation includes a relatively low amount of rosin combined with a viscous solvent system, thixotropic agents, activators, additives, and optionally plasticizers.

Career Highlights

Quan Sheng is associated with W.C. Heraeus Holding GmbH, where he has been instrumental in advancing solder paste technology. His work has been pivotal in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

Some of his notable coworkers include Jens Nachreiner and Muriel Thomas, who have collaborated with him on various projects within the company.

Conclusion

Quan Sheng's innovative work in developing no-clean low-residue solder paste has made a significant impact on the semiconductor industry. His contributions continue to influence the field and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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