This inventor holds 1 USPTO granted patent. Top assignee: Dupont Electronics, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Qiu Dai and Polymer Compositions for Photoresists.
Introduction
Qiu Dai is an inventor associated with Centerville, Ohio, and Dupont Electronics, Inc. His patent work concerns polymer compositions designed for use in photoresists.
Latest Patents
Dai is credited with 1 patent: “Polymer Compositions Having Photoacid Generators and Photoresists.” The patent describes a polymer composition containing hydroxystyrene repeat units, sulfonated photoacid generator repeat units, and acid-labile repeat units, each specified at 0.5 to 99 mol percent. It also describes a photoresist composition that includes this polymer composition.
Career Highlights
Dai’s documented patent contribution focuses on materials for photoresist formulations. The disclosed combination of polymer components is intended to incorporate photoacid-generating functionality into the composition.
Collaborations
The listed coworkers associated with Dai include Yongqiang Zhang and Michael Thomas Sheehan.
Conclusion
Qiu Dai’s patent record highlights his contribution to polymer compositions and photoresist technology through a formulation combining hydroxystyrene, sulfonated photoacid generator, and acid-labile repeat units.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile