Company Filing History:
Years Active: 2022
Title: Qingxuan Wang: Innovator in Physical Vapor Deposition Technology
Introduction
Qingxuan Wang is a notable inventor based in Beijing, China. He has made significant contributions to the field of microelectronics, particularly through his innovative designs in loading and physical vapor deposition (PVD) apparatuses. His work is instrumental in enhancing the efficiency and reliability of microelectronic manufacturing processes.
Latest Patents
Qingxuan Wang holds 1 patent for his invention titled "Loading apparatus and physical vapor deposition apparatus." This patent describes a loading apparatus that includes a pedestal designed to support a workpiece. The apparatus features a first support member that pushes up a cover ring when the pedestal is in operation, preventing contact between the cover ring and the workpiece. This design minimizes stress forces on the workpiece from external components, thereby improving the overall performance of the PVD apparatus.
Career Highlights
Qingxuan Wang is associated with Beijing Naura Microelectronics Equipment Co., Ltd., where he applies his expertise in microelectronics. His innovative approach to PVD technology has positioned him as a key player in the industry, contributing to advancements that benefit manufacturing processes.
Collaborations
Qingxuan Wang has worked alongside talented colleagues, including Xuewei Wu and Tong Wang. Their collaborative efforts in the field of microelectronics have fostered an environment of innovation and progress.
Conclusion
Qingxuan Wang's contributions to the field of physical vapor deposition technology exemplify the impact of innovative thinking in microelectronics. His patent and work at Beijing Naura Microelectronics Equipment Co., Ltd. highlight his commitment to advancing technology in this critical industry.