Beijing Naura Microelectronics Equipment Co., Ltd.

Qingxuan Wang

Ming Wang

Ye Liu

Jun Zhang

Shuai Zhang

Henan Zhang

Tong Wang

Boyu Dong

Bingliang Guo

Tao Han

Shaohui Liu

Xuewei Wu

Huaichao Ma

Baogang Xu

Yujie Geng

Yuehua Sui

Genyu Cui

Fang Guan

Long Xue

Yaxin Cui

Kangning Zhao

Qiang Li

Min Fang

Yanbin Liu

Liguo Han

Xikui Cui

Xiaohu Cao

Xiaojun Zhang

Jiankuo Zhang

Bin Song

The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.

Loading apparatus and physical vapor deposition apparatus

Growing community of inventors

Beijing, China

Qingxuan Wang