Company Filing History:
Years Active: 1999-2001
Title: Qinghua Zhong: Innovator in Semiconductor Fabrication
Introduction
Qinghua Zhong is a prominent inventor based in Singapore, known for his contributions to semiconductor fabrication. With a total of 3 patents, he has made significant advancements in the field, particularly in methods that enhance the efficiency and effectiveness of integrated circuit manufacturing.
Latest Patents
One of his latest patents is a method to reduce trench cone formation in the fabrication of shallow trench isolations. This innovative approach involves forming a silicon dioxide layer over a semiconductor substrate, followed by the deposition of a silicon nitride layer. The silicon nitride layer is then patterned to expose the semiconductor substrate for shallow trench isolations. Ions are implanted into the exposed substrate, damaging any passive surface materials. The etching process forms trenches while removing the damaged materials, thus preventing trench cone formation. Finally, a trench filling layer is deposited and polished to complete the shallow trench isolations in integrated circuit devices.
Another notable patent is a method to protect the chamber wall from etching by endpoint plasma clean. This method controls the cleaning level of the etch chamber by measuring light emissions caused by particles within the plasma. The cleaning process is initiated when contaminant levels are deemed too high, and it is considered complete when the light intensity from existing particles drops by a specified percentage.
Career Highlights
Qinghua Zhong is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to innovate in semiconductor technologies. His work has significantly impacted the efficiency of manufacturing processes in the industry.
Collaborations
He collaborates with notable colleagues, including Poh Suan Tan and Lap Chan, contributing to a dynamic and innovative work environment.
Conclusion
Qinghua Zhong's contributions to semiconductor fabrication through his patents demonstrate his commitment to advancing technology in the field. His innovative methods not only enhance manufacturing processes but also pave the way for future developments in integrated circuit design.