Qingfeng Kong

Title: Qingfeng Kong: Innovator in Photolithography Processes

Introduction

Qingfeng Kong is a notable inventor based in Beijing, China. He has made significant contributions to the field of photolithography, particularly in the alignment of quadrate wafers during the manufacturing process. His innovative methods aim to enhance the yield of chips produced from these wafers.

Latest Patents

Qingfeng Kong holds a patent for a "Method of aligning quadrate wafer in first photolithography process." This invention provides a systematic approach to aligning quadrate wafers, which includes several key steps. The method involves fabricating mask aligning markers in the periphery region of a mask used for the first exposure process. During the exposure, the quadrate wafer is positioned using these markers, ensuring accurate alignment. Subsequent exposure processes utilize aligning markers obtained during the first exposure, which helps maintain the integrity of the dies at the wafer's periphery. This method is designed to be easily and reliably performed, ultimately increasing the yield of chips produced.

Career Highlights

Qingfeng Kong is affiliated with the Chinese Academy of Sciences, where he continues to advance research and development in photolithography techniques. His work has been instrumental in improving manufacturing processes within the semiconductor industry.

Collaborations

He has collaborated with esteemed colleagues such as Jinmin Li and Junxi Wang, contributing to various projects that enhance the efficiency and effectiveness of photolithography processes.

Conclusion

Qingfeng Kong's innovative methods in photolithography represent a significant advancement in the field, showcasing his dedication to improving manufacturing processes. His contributions are vital for the ongoing development of semiconductor technology.